VECTOR Express Recognized for Performance Excellence In CVD Equipment SAN JOSE, Calif., Dec. 3
SAN JOSE, Calif., Dec. 3 /PRNewswire-FirstCall/ -- Novellus Systems
announced that its industry-leading VECTOR Express(TM) tool had received the
"2008 Excellent Performance in CVD Equipment Award" from the Taiwan
Semiconductor Manufacturing Company (TSMC) at their 2008 Supply Chain
Management Forum. The award highlights Novellus' success in supporting TSMC's
need for high productivity in manufacturing while enabling innovative next
generation plasma enhanced chemical vapor deposition (PECVD) solutions in R&D.
Novellus was one of six suppliers recognized by TSMC.
"We are honored to receive this award from TSMC in recognition of VECTOR
Express' contribution to their leading-edge foundry operations," said Tom
Caulfield, executive vice president, Sales, Marketing, and Customer Service at
Novellus Systems. "First released at the 130nm node, the VECTOR platform
continues to be the benchmark for technology and productivity for the 45nm
device generation. This success was driven by engineering the platform to meet
not only technical challenges in film quality, uniformity and defectivity, but
also by continually driving low cost of ownership through productivity -- thus
helping customers keep pace with Moore's Law."
Since its introduction to the market in March 2007, VECTOR Express has met
with rapid industry adoption. The platform offers flexibility to produce
various BEOL and FEOL dielectric films on the same tool. Additionally, the
VECTOR Express enables fabs to increase production capacity in a more cost
efficient manner than similar tools on the market.
About VECTOR Express:
The VECTOR Express PECVD platform is used to deposit a variety of films
for memory and logic devices. VECTOR Express delivers industry-leading
productivity and fundamental thin film process improvement with its
SmartSoak(TM) processing feature. SmartSoak takes advantage of the VECTOR
platform's multi-station sequential processing (MSSP) architecture to control
wafer heat-up independently from film deposition. This enables a more stable
and consistent wafer temperature at the start of film deposition while
simultaneously reducing thin film processing time.
About Novellus:
Novellus Systems, Inc. (Nasdaq: NVLS) is a leading provider of advanced
process equipment for the global semiconductor industry. The company's
products deliver value to customers by providing innovative technology backed
by trusted productivity. An S&P 500 company, Novellus is headquartered in San
Jose, Calif. with subsidiary offices across the globe. For more information,
please visit http://www.novellus.com
About TSMC:
TSMC is the world's largest dedicated semiconductor foundry, providing the
industry's leading process technology and the foundry's largest portfolio of
process-proven libraries, IP, design tools and reference flows. The Company's
total managed capacity in 2008 is to exceed nine million (8-inch equivalent)
wafers, including capacity from two advanced 12-inch Gigafabs, four eight-inch
fabs, one six-inch fab, as well as TSMC's wholly owned subsidiaries, WaferTech
and TSMC (Shanghai), and its joint venture fab, SSMC. TSMC is the first
foundry to provide 40nm production capabilities. Its corporate headquarters
are in Hsinchu, Taiwan. For more information about TSMC please see
http://www.tsmc.com
SOURCE Novellus Systems, Inc.
