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Akrion Selected for 300mm Wafer Cleaning

Posted : Thu, 07 Dec 2006 14:31:02 GMT
Author : Akrion, Inc.
Category : Press Release
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ALLENTOWN, Pa., Dec. 7 /PRNewswire/ -- Akrion, Inc. recently received a purchase order for two (2) 300mm GAMA(TM) i-Clean(TM) systems from a major manufacturer's fab in Asia. Each system utilizes Akrion's patented watermark- free surface tension gradient (STG) dryer and two (2) i-Clean in situ modules.
i-Clean is capable of performing seven process steps in one tank. By combining DIO3(TM), HF, SC1 and SC2 chemical processes with their associated rinses, i-Clean greatly reduces system footprint compared to traditional FEOL clean configurations. i-Clean uses renowned "Verteq" VcS megasonics for superior particle removal performance and reduced cycle time.
James S. Molinaro, Akrion President and CEO, said, "Akrion's i-Clean system is getting a good reputation for advanced performance from customers worldwide. We have a significant installed base of 300mm i-Clean tools in the field. Configurations are being used for a wide variety of FEOL cleaning applications, such as Pre-diffusion cleaning and Wafer Reclaim."
About Akrion
Akrion, Inc.
CONTACT: Donald Roberts, Akrion, Inc., +1-610-530-3368

Copyright © 2008 PR Newswire. All rights reserved.




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